High-temperature threshold characteristics of a symmetrically graded InAlAs/ InxGa1−xAs/GaAs metamorphic high electron mobility transistor

نویسندگان

  • C. S. Lee
  • Y. J. Chen
  • W. C. Hsu
  • K. H. Su
  • J. C. Huang
  • D. H. Huang
  • C. L. Wu
چکیده

High-temperature threshold characteristics of a symmetrically graded -doped InAlAs/ InxGa1−xAs/GaAs x=0.5→0.65→0.5 metamorphic high electron mobility transistor MHEMT have been investigated. The thermal threshold coefficients, defined as Vth / T, are superiorly low at 0.9 mV/K from 300 to 420 K and at −0.75 mV/K from 420 to 500 K. An interesting polarity change of the thermal threshold coefficient was observed around 420 K due to the variation of thermal modulation effects. The present MHEMT device, with stabilized thermal threshold variations and superior high-temperature linearity characteristics, is promising for high-temperature circuit applications. © 2006 American Institute of Physics. DOI: 10.1063/1.2208926

برای دانلود رایگان متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

Comparative Studies on Double -Doped Al0.3Ga0.7As/InxGa1−xAs/GaAs Symmetrically Graded Doped-Channel Field-Effect Transistors

This work provides comparative studies of a double -doped Al0.3Ga0.7As/InxGa1−xAs/GaAs symmetrically graded x = 0.15 → 0.2 → 0.15 doped-channel field-effect transistor DD-DCFET with respect to a conventional double -doped pseudomorphic high electron mobility transistor pHEMT and a conventional DCFET structure. All threes samples, grown by the low-pressure metallorganic chemical vapor deposition...

متن کامل

Characteristics Study of Modulation Doped GaAs/InxGa1-xAs/AlxGa1-xAs based Pseudomorphic HEMT

The High Electron Mobility Transistor (HEMT) is a small geometry hetero-junction device that exploits the high electron mobility in an undoped region to achieve high speed operation. Hetero-junction is used to create a narrow undoped electron well which forms the channel for current flow. The electron mobility in the channel is found to be maximum due to the adequate presence of Indium quantity...

متن کامل

TESI PER IL CONSEGUIMENTO DEL TITOLO DI DOTTORE IN RICERCA Structural and transport studies of InAlAs/InGaAs quantum wells

The relationship between structural and low-temperature transport properties is explored for InxAl1-xAs/InxGa1-xAs metamorphic quantum wells with x > 0.7 grown on GaAs by molecular beamepitaxy. Different step-graded buffer layers are used to gradually adapt the in-plane latticeparameter from the GaAs towards the InGaAs value. We show that using buffer layers with asuitable maxim...

متن کامل

Comparison of As- and P-based metamorphic buffers for high performance InP heterojunction bipolar transistor and high electron mobility transistor applications

Metamorphic buffers ~M-buffers! consisting of graded InAlAs or bulk InP were employed for the production of InP-based epiwafers on GaAs substrates by molecular-beam epitaxy. The graded InAlAs is the standard for production metamorphic high electron mobility transistors ~M-HEMTs!, while the bulk InP offers superior thermal properties for higher current density circuits. The surface morphology an...

متن کامل

Reliability and degradation mechanism of AlGaAs/InGaAs and InAlAs/InGaAs HEMTs

The long-term stability of AlGaAs/GaAs and InAlAs/InGaAs high electron mobility transistors (HEMTs), tested under high drain voltage and/or high temperature operation is reported. HEMTs with high In content in the active channel, alternatively fabricated on InP substrates and on GaAs substrates covered by a metamorphic buffer (MHEMT), are compared. Despite the high dislocation density in the bu...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

عنوان ژورنال:

دوره   شماره 

صفحات  -

تاریخ انتشار 2006